华体会官方网页版-华体会(中国):New Insights into the Interface Trap Generation during Hot Carrier Degradation: Impacts of Full-band Electronic Resonance, (100) vs (110), and nMOS vs pMOS
Wang, Zirui; Lu, Haoran; Sun, Zixuan; Shen, Cong; Peng, Baokang; Li, Wen-Feng; Xue, Yongkang; Wang, Da; Ji, Zhigang; Zhang, Lining; Liu, Yue-Yang; Jiang, Xiangwei; Wang, Runsheng; Huang, Ru Source: Technical Digest - International Electron Devices Meeting, IEDM, 2023, 2023 International Electron Devices Meeting, IEDM 2023;
Abstract:
In this paper, the underlying physics of interface trap generation in CMOS devices are revealed, by using full-band distribution of H atom electronic resonance states in Si-H bond at Si/SiO2 interface, instead of previously assumed single resonance level. The idea is verified and quantified by advanced time-dependent DFT (TDDFT) calculations. Based on this, the hot carrier degradation can be well modeled to surprisingly cover a broad range of technologies and stress conditions, due to the multiple peaks found in the full-band resonance states, and a TCAD simulation flow is proposed. The model is experimentally validated, from classic region (130nm Planar) to advanced region (16/14nm FinFET) and extendable to GAA, covering both (100) & (110) and n & p channels with various Vgs/Vds bias conditions. This work provides a universal understanding and efficient simulation framework for the hot carrier reliability.
? 2023 IEEE. (15 refs.)
